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Photonics Research
Vol. 3, Issue 4, 110 (2015)

Growth of large-area atomically thin MoS₂ film via ambient pressure chemical vapor deposition

Caiyun Chen¹, Hong Qiao¹, Yunzhou Xue¹, Wenzhi Yu¹..., Jingchao Song², Yao Lu¹, Shaojuan Li¹ and Qiaoliang Bao^1,2,*|Show fewer author(s)

Author Affiliations

¹Institute of Functional Nano and Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215123, China

²Department of Materials Engineering, Monash University, Clayton, Victoria 3800, Australia

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DOI: 10.1364/PRJ.3.000110 Cite this Article Set citation alerts

Caiyun Chen, Hong Qiao, Yunzhou Xue, Wenzhi Yu, Jingchao Song, Yao Lu, Shaojuan Li, Qiaoliang Bao, "Growth of large-area atomically thin MoS₂ film via ambient pressure chemical vapor deposition," Photonics Res. 3, 110 (2015) Copy Citation Text

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References

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CLP Journals

[1] Xingxing Liu, Shaowei Wang, Hui Xia, Xutao Zhang, Ruonan Ji, Tianxin Li, Wei Lu, "Interference-aided spectrum-fitting method for accurate film thickness determination," Chin. Opt. Lett. 14, 081203 (2016)

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Caiyun Chen, Hong Qiao, Yunzhou Xue, Wenzhi Yu, Jingchao Song, Yao Lu, Shaojuan Li, Qiaoliang Bao, "Growth of large-area atomically thin MoS₂ film via ambient pressure chemical vapor deposition," Photonics Res. 3, 110 (2015)

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