• Chinese Physics B
  • Vol. 29, Issue 8, (2020)
Ke-Xiu Dong1, Dun-Jun Chen2、†, Qing Cai2, Yan-Li liu3, and Yu-Jie Wang1
Author Affiliations
  • 1School of Mechanical and Electrical Engineering, Chuzhou University, Chuzhou 239000, China
  • 2Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 10093, China
  • 3School of Information and Electronic Engineering, Shandong Technology and Business University, Yantai 264005, China
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    DOI: 10.1088/1674-1056/ab90f1 Cite this Article
    Ke-Xiu Dong, Dun-Jun Chen, Qing Cai, Yan-Li liu, Yu-Jie Wang. Theoretical analysis for AlGaN avalanche photodiodes with mesa and field plate structure[J]. Chinese Physics B, 2020, 29(8): Copy Citation Text show less
    Schematic structure of (a) standard AlGaN SAM APD with bevel angle and FP termination, and (b) standard AlGaN SAM APD with triple-mesa and FP termination.
    Fig. 1. Schematic structure of (a) standard AlGaN SAM APD with bevel angle and FP termination, and (b) standard AlGaN SAM APD with triple-mesa and FP termination.
    (a) I–V characteristics in dark and under illumination and gain for AlGaN SAM APD with different bevel angles and FP structure, (b) schematic structure of AlGaN SAM APD without FP, and (c) I–V characteristics in dark and under illumination as well as gain for AlGaN SAM APD without FP.
    Fig. 2. (a) IV characteristics in dark and under illumination and gain for AlGaN SAM APD with different bevel angles and FP structure, (b) schematic structure of AlGaN SAM APD without FP, and (c) IV characteristics in dark and under illumination as well as gain for AlGaN SAM APD without FP.
    Simulated two-dimensional electric field distribution for APD with bevel angle of (a) 10°, (b) 20°, (c) 40°, and (d) 60°, and electric field distribution along x direction in multiplication layer at (e) y = 190 nm, (f) y = 280 nm, (g) y = 350 nm with reverse bias 30 V.
    Fig. 3. Simulated two-dimensional electric field distribution for APD with bevel angle of (a) 10°, (b) 20°, (c) 40°, and (d) 60°, and electric field distribution along x direction in multiplication layer at (e) y = 190 nm, (f) y = 280 nm, (g) y = 350 nm with reverse bias 30 V.
    (a) Two-dimensional electric field for AlGaN APD with 60° bevel angle and FP structure at reverse bias of 30 V, (b) electric field distribution along x direction in multiplication layer for 60° bevelled AlGaN APD with and without FP structure.
    Fig. 4. (a) Two-dimensional electric field for AlGaN APD with 60° bevel angle and FP structure at reverse bias of 30 V, (b) electric field distribution along x direction in multiplication layer for 60° bevelled AlGaN APD with and without FP structure.
    I–V characteristic curves in dark and under illunination and gain for AlGaN APDs with different mesa sizes (a) with and (b) without FP. (c) Schematic structure of AlGaN APD with triple-mesa structure.
    Fig. 5. IV characteristic curves in dark and under illunination and gain for AlGaN APDs with different mesa sizes (a) with and (b) without FP. (c) Schematic structure of AlGaN APD with triple-mesa structure.
    Two-dimensional electric field distribution at reverse bias of 30 V for APD with first-mesa size (a) 5.2 μm, (b) 4 μm, and (c) 1.6 μm.
    Fig. 6. Two-dimensional electric field distribution at reverse bias of 30 V for APD with first-mesa size (a) 5.2 μm, (b) 4 μm, and (c) 1.6 μm.
    Two-dimensional electric field distribution at reverse bias of 30 V for the APD with FP and first-mesa size (a) 5.2 μm, (b) 4 μm, (c) 1.6 μm, and (d) ideal structure.
    Fig. 7. Two-dimensional electric field distribution at reverse bias of 30 V for the APD with FP and first-mesa size (a) 5.2 μm, (b) 4 μm, (c) 1.6 μm, and (d) ideal structure.
    Ke-Xiu Dong, Dun-Jun Chen, Qing Cai, Yan-Li liu, Yu-Jie Wang. Theoretical analysis for AlGaN avalanche photodiodes with mesa and field plate structure[J]. Chinese Physics B, 2020, 29(8):
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