• Journal of Infrared and Millimeter Waves
  • Vol. 22, Issue 6, 419 (2003)
[in Chinese]1, [in Chinese]2, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese]. DEPOSITION PROCESS STUDY OF VANADIUM OXIDE THIN FILMS FOR MICROBOLOMETER[J]. Journal of Infrared and Millimeter Waves, 2003, 22(6): 419 Copy Citation Text show less
    References

    [1] MORIN F J. Oxide which show a metal-to-insulator transition at the neel temperature. Phys. Review Letter, 1959, 3: 34-36

    [2] FAN J C C. Thin film VO2 submillimeter. wave modulators and polarizers. Appl. Phys. Lett, 1977, 31: 11-14

    [3] CHUDNOVSKⅡ F A. Metal-semicondutor phase transition in vanadium oxide and technical Application. Sov. Phys. Tech. Phys, 1976, 20: 999-1001

    [4] EDEN D D. Some Application involving the semiconductor to metal phase transition in VO2. Proc. Soc. Photo-Opt. Instrum. Eng, 1979, 185: 97-101

    [5] SPECK K R. Vanadium dioxide films grown from vanadium tetra-isopropoxide by the sol-gel process. Thin solid Films, 1988, 165: 317-320

    [6] JIN P. Dependence of microstructure and thermochromism on substrate temperature for sputter-deposition VO2 epitaxial film. J.vac.sci. Technol, 1997, A15(3): 1113-1119

    [7] Nagashima M, Wada H. Near infrared optical properties of laser ablated VOx thin films by ellipsometry. Thin Solid Films, 1998, 312: 61-67

    [in Chinese], [in Chinese], [in Chinese]. DEPOSITION PROCESS STUDY OF VANADIUM OXIDE THIN FILMS FOR MICROBOLOMETER[J]. Journal of Infrared and Millimeter Waves, 2003, 22(6): 419
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