Vanadium oxide thin films were deposited onto quartz glass and silicon substrates by radio frequency reactive sputtering methods. The surface morphology, structural features and properties of films were studied by X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS), atomic force spectroscopy(AFM), spectrophotometer and resistance measurement methods to ensure the growth of the deposited films. These investigation shown that the deposited thin film has TCR value over 1.8% per degree centigrade and square resistance of 22±5kΩ/□.