• Laser & Optoelectronics Progress
  • Vol. 57, Issue 9, 091201 (2020)
Jiayin Yu1, Jing Fan2, Xuhui Lan1, Xiaoyan Shen1、*, and Jing Yu1
Author Affiliations
  • 1College of Metrology & Measurement Engineering, China Jiliang University, Hangzhou, Zhejiang 310018, China;
  • 2Technical Monitoring Center of Changqing Oilfield Company, Xi'an, Shaanxi 710021, China
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    DOI: 10.3788/LOP57.091201 Cite this Article Set citation alerts
    Jiayin Yu, Jing Fan, Xuhui Lan, Xiaoyan Shen, Jing Yu. Influence of Reflection-Induced Retardance on the Measurement of Fabry-Perot Etalon Interval[J]. Laser & Optoelectronics Progress, 2020, 57(9): 091201 Copy Citation Text show less

    Abstract

    Based on the optical thin film theory, the optical characteristic matrix method was used to derive a mathematical model of the reflection-induced retardance and incident angle of the high-reflection film for air-gap Fabry-Perot (F-P) etalon. The change in the reflection-induced retardance at incident angle ranging 0°-3° was analyzed using TFCalc membrane design software, and the mathematical model was verified. Results show that the reflection-induced retardance and the incident angle exponentially increase, and the reflection-induced retardance is close to 2.88×10 -3 rad when the incident angle is 3°. The experiment setup of the F-P interference imaging optical path, demonstrates that the F-P etalon interval is (2015.50919±0.00002) μm and the relative error limit is approximately 8.6×10 -9. Compared with the measurements that do not consider the reflection phase shift [the interval is (2015.50864±0.00082) μm and the relative error limit is approximately 9×10 -7], the measurement accuracy shows significant improvement.
    Jiayin Yu, Jing Fan, Xuhui Lan, Xiaoyan Shen, Jing Yu. Influence of Reflection-Induced Retardance on the Measurement of Fabry-Perot Etalon Interval[J]. Laser & Optoelectronics Progress, 2020, 57(9): 091201
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