• Chinese Journal of Quantum Electronics
  • Vol. 40, Issue 3, 415 (2023)
CHEN Qiming1、*, FU Renxuan1, XU Yongjun1, LIU Yibiao1, ZHOU Jinyun2, and SONG Xianwen1
Author Affiliations
  • 1Institute of Electromechanical Engineering, Guangdong Polytechnic of Industry and Commerce, Guangzhou 510550, China
  • 2Guangdong University of Technology, Guangzhou 510006, China
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    DOI: 10.3969/j.issn.1007-5461.2023.03.014 Cite this Article
    Qiming CHEN, Renxuan FU, Yongjun XU, Yibiao LIU, Jinyun ZHOU, Xianwen SONG. Fabrication of SU-8 microstructure and PDMS concentration gradient generator by moving focal plane front and back exposure[J]. Chinese Journal of Quantum Electronics, 2023, 40(3): 415 Copy Citation Text show less
    Schematic of DMD maskless lithography system
    Fig. 1. Schematic of DMD maskless lithography system
    Schematic of the three-level right-angle channel CGGs
    Fig. 2. Schematic of the three-level right-angle channel CGGs
    Schematic of moving focal plane front and back exposure
    Fig. 3. Schematic of moving focal plane front and back exposure
    Schematic diagram of processing flows of three-dimensional PDMS microfluidic channel. (a) Spin-coating, soft-bake;(b) Exposure; (c) Post-bake; (d) Development, hard-bake; (e) PDMS molding; (f) Thermally crosslinking, uncovering membrane
    Fig. 4. Schematic diagram of processing flows of three-dimensional PDMS microfluidic channel. (a) Spin-coating, soft-bake;(b) Exposure; (c) Post-bake; (d) Development, hard-bake; (e) PDMS molding; (f) Thermally crosslinking, uncovering membrane
    LSCM images of the SU-8 CGG. (a) 2D image; (b) 3D image; (c) Cross section profile by LEXT
    Fig. 5. LSCM images of the SU-8 CGG. (a) 2D image; (b) 3D image; (c) Cross section profile by LEXT
    LSCM images of the PDMS CGG. (a) 2D image; (b) 3D image; (c) Cross section profile by LEXT
    Fig. 6. LSCM images of the PDMS CGG. (a) 2D image; (b) 3D image; (c) Cross section profile by LEXT
    Measurement result of (a) SU-8 microstructure and (b) PDMS CGG by step profiler
    Fig. 7. Measurement result of (a) SU-8 microstructure and (b) PDMS CGG by step profiler
    Qiming CHEN, Renxuan FU, Yongjun XU, Yibiao LIU, Jinyun ZHOU, Xianwen SONG. Fabrication of SU-8 microstructure and PDMS concentration gradient generator by moving focal plane front and back exposure[J]. Chinese Journal of Quantum Electronics, 2023, 40(3): 415
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