• Acta Optica Sinica
  • Vol. 32, Issue 3, 322005 (2012)
Yang Guanghua* and Li Yanqiu
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/aos201232.0322005 Cite this Article Set citation alerts
    Yang Guanghua, Li Yanqiu. Thermal and Structural Deformation of Projection Optics and Its Influence on Optical Imaging Performance for 22 nm Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(3): 322005 Copy Citation Text show less
    References

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    [2] A. K. Ray-Chaudhuri, S. E.Gianoulakis, P. A. Spence et al.. Impact of thermal and structural effects on EUV lithographic[C]. SPIE, 1998, 3331: 10~12

    [3] Y. Li, K. Ota, K. Murakami. Thermal and structual deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography [J]. J. Vacuum Sci. Technol. B, 2003, 21(1): 127~129

    [4] Ke Liu, Yanqiu Li. Transient thermal and structual deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography [J]. Jpn. J. Appl. Phys., 2007, 46(10A): 6568~6572

    [5] Liu Fei, Li Yanqiu. Design of high numerical aperture projection objective for industrial extreme ultraviolet lithgraphy[J] . Acta Optica Sinica, 2011, 31(2): 022200321

    [6] Virek Bakshi. EUV Sources for Lithography [M]. Washington: SPIE Press, 2005. 31

    [7] Nikon Corporation. Hexapod kinematic mountings for optical elements, and optical systems comprising same [P], United States: US2007/0284502[P]. [2007-12-13]

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    Yang Guanghua, Li Yanqiu. Thermal and Structural Deformation of Projection Optics and Its Influence on Optical Imaging Performance for 22 nm Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(3): 322005
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