[1] Atabaki A H, Moazeni S, Pavanello F et al. Integrating photonics with silicon nanoelectronics for the next generation of systems on a chip[J]. Nature, 556, 349-354(2018).
[2] Ingerly D B, Amin S, Aryasomayajula L et al. Foveros: 3D integration and the use of face-to-face chip stacking for logic devices[C](2019).
[3] Kum H, Lee D, Kong W et al. Epitaxial growth and layer-transfer techniques for heterogeneous integration of materials for electronic and photonic devices[J]. Nature Electronics, 2, 439-450(2019).
[4] Gale M T, Knop K. The fabrication of fine lens arrays by laser beam writing[J]. Proceedings of SPIE, 0398, 347-353(1983).
[5] Wang S, Zhou Z, Li B et al. Progresses on new generation laser direct writing technique[J]. Materials Today Nano, 16, 100142(2021).
[6] Venkatakrishnan K, Ngoi B K A, Stanley P et al. Laser writing techniques for photomask fabrication using a femtosecond laser[J]. Applied Physics A, 74, 493-496(2002).
[7] Qin L, Huang Y Q, Xia F et al. 5 nm nanogap electrodes and arrays by super-resolution laser lithography[J]. Nano Letters, 20, 4916-4923(2020).
[8] Cai J G, Lü C, Watanabe A. Laser direct writing and selective metallization of metallic circuits for integrated wireless devices[J]. ACS Applied Materials & Interfaces, 10, 915-924(2018).
[9] Gissibl T, Thiele S, Herkommer A et al. Two-photon direct laser writing of ultracompact multi-lens objectives[J]. Nature Photonics, 10, 554-560(2016).
[10] Wang M, Liu Q, Zhang H R et al. Laser direct writing of tree-shaped hierarchical cones on a superhydrophobic film for high-efficiency water collection[J]. ACS Applied Materials & Interfaces, 9, 29248-29254(2017).
[11] Wanzenboeck H D, Waid S[M]. Focused ion beam lithography(2011).
[12] Vieu C, Carcenac F, Pépin A et al. Electron beam lithography: resolution limits and applications[J]. Applied Surface Science, 164, 111-117(2000).
[13] Zheludev N I. What diffraction limit?[J]. Nature Materials, 7, 420-422(2008).
[14] Zhang Y L, Chen Q D, Xia H et al. Designable 3D nanofabrication by femtosecond laser direct writing[J]. Nano Today, 5, 435-448(2010).
[15] Scott T F, Kowalski B A, Sullivan A C et al. Two-color single-photon photoinitiation and photoinhibition for subdiffraction photolithography[J]. Science, 324, 913-917(2009).
[16] Li L J, Gattass R R, Gershgoren E et al. Achieving λ/20 resolution by one-color initiation and deactivation of polymerization[J]. Science, 324, 910-913(2009).
[17] Fischer J, von Freymann G, Wegener M. The materials challenge in diffraction-unlimited direct-laser-writing optical lithography[J]. Advanced Materials, 22, 3578-3582(2010).
[18] Cao Y Y, Gan Z S, Jia B H et al. High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization[J]. Optics Express, 19, 19486-19494(2011).
[19] Gan Z S, Cao Y Y, Evans R A et al. Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size[J]. Nature Communications, 4, 2061(2013).
[20] Wollhofen R, Katzmann J, Hrelescu C et al. 120 nm resolution and 55 nm structure size in STED-lithography[J]. Optics Express, 21, 10831-10840(2013).
[21] Wollhofen R, Buchegger B, Eder C et al. Functional photoresists for sub-diffraction stimulated emission depletion lithography[J]. Optical Materials Express, 7, 2538-2559(2017).
[22] Hell S W, Wichmann J. Breaking the diffraction resolution limit by stimulated emission: stimulated-emission-depletion fluorescence microscopy[J]. Optics Letters, 19, 780-782(1994).
[23] Wu H K, Odom T W, Whitesides G M. Connectivity of features in microlens array reduction photolithography: generation of various patterns with a single photomask[J]. Journal of the American Chemical Society, 124, 7288-7289(2002).
[24] Jin J J, Pu M B, Wang Y Q et al. Multi-channel vortex beam generation by simultaneous amplitude and phase modulation with two-dimensional metamaterial[J]. Advanced Materials Technologies, 2, 1600201(2017).
[25] Tsai H Y, Thomas S W, Menon R. Parallel scanning-optical nanoscopy with optically confined probes[J]. Optics Express, 18, 16014-16024(2010).
[26] Li X P, Cao Y Y, Tian N et al. Multifocal optical nanoscopy for big data recording at 30 TB capacity and gigabits/second data rate[J]. Optica, 2, 567-570(2015).
[27] Saha S K, Wang D E, Nguyen V H et al. Scalable submicrometer additive manufacturing[J]. Science, 366, 105-109(2019).
[28] Zhang R J[M]. Nanoscale integrated circuits-the manufacturing process(2014).
[30] Sun M T, Li Y Z[M]. One-and two-photon absorptions: principles and applications(2018).
[31] Hell S W. Far-field optical nanoscopy[J]. Science, 316, 1153-1158(2007).
[32] Fischer J, Wegener M. Ultrafast polymerization inhibition by stimulated emission depletion for three-dimensional nanolithography[J]. Advanced Materials, 24, OP65-OP69(2012).