• Journal of Semiconductors
  • Vol. 40, Issue 7, 070403 (2019)
Jie Jiang and Zhenhua Ni
Author Affiliations
  • School of Physics, Southeast University, Nanjing 211189, China
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    DOI: 10.1088/1674-4926/40/7/070403 Cite this Article
    Jie Jiang, Zhenhua Ni. Defect engineering in two-dimensional materials[J]. Journal of Semiconductors, 2019, 40(7): 070403 Copy Citation Text show less
    References

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    [2] D H Lien, S Z Uddin, M Yeh et al. Electrical suppression of all nonradiative recombination pathways in monolayer semiconductors. Science, 364, 468(2019).

    [3] H V Han, A Y Lu, L S Lu et al. Photoluminescence enhancement and structure repairing of monolayer MoSe2 by hydrohalic acid treatment. ACS Nano, 10, 1454(2016).

    [4] H Nan, Z Wang, W Wang et al. Strong photoluminescence enhancement of MoS2 through defect engineering and oxygen bonding. ACS Nano, 8, 5738(2014).

    [5] Z Yu, Y Pan, Y Shen et al. Towards intrinsic charge transport in monolayer molybdenum disulfide by defect and interface engineering. Nat Commun, 5, 5290(2014).

    [6] X Zhang, Q Liao, S Liu et al. Poly (4-styrenesulfonate)-induced sulfur vacancy self-healing strategy for monolayer MoS2 homojunction photodiode. Nat Commun, 8, 15881(2017).

    [7] J Jiang, C Ling, T Xu et al. Defect engineering for modulating the trap states in 2D photoconductors. Adv Mater, 30, 1804332(2018).

    [8] M Tosun, L Chan, M Amani et al. Air-stable n-doping of WSe2 by anion vacancy formation with mild plasma treatment. ACS Nano, 10, 6853(2016).

    [9] F Giannazzo, G Fisichella, G Greco et al. Ambipolar MoS2 transistors by nanoscale tailoring of Schottky barrier using oxygen plasma functionalization. ACS Appl Mater Inter, 9, 23164(2017).

    Jie Jiang, Zhenhua Ni. Defect engineering in two-dimensional materials[J]. Journal of Semiconductors, 2019, 40(7): 070403
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