• Infrared and Laser Engineering
  • Vol. 46, Issue 6, 606003 (2017)
Liu Zhichao*, Zheng Yi, Pan Feng, Wang Zhen, Wang Jian, and Xu Qiao
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/irla201746.0606003 Cite this Article
    Liu Zhichao, Zheng Yi, Pan Feng, Wang Zhen, Wang Jian, Xu Qiao. Effect of 1 064 nm laser conditioning on damage morphology change process on HfO2/SiO2 reflective film[J]. Infrared and Laser Engineering, 2017, 46(6): 606003 Copy Citation Text show less
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    [3] Sheehan L, Kozlowski M, Tench B. Full aperture laser conditioning of multilayer mirrors and polarizers[C]//SPIE, 1997, 2633: 457-463.

    [4] Zhao Yuanan, Shao Jianda, He Hongbo, et al. Laser conditioning of high-reflective and anti-reflective coatings at 1 064 nm[C]//SPIE, 2005, 5991: 599117.

    [5] Liu Xiaofeng, Li Dawei, Li Xiao, et al. 1 064 nm laser conditioning effect of HfO2/SiO2 high reflectors deposited by E-beam[J]. Chinese Journal of Lasers, 2009, 36(6): 1545-1549. (in Chinese)

    [6] Zheng Yi, Liu Zhichao, Ma Ping, et al. Laser conditioning technique of mid-size laser spot[J]. High Power Laser and Particle Beams, 2013, 25(12): 3180-3184. (in Chinese)

    [7] Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO2/SiO2 high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27(3): 032034. (in Chinese)

    [8] Liu Zhichao, Luo Jin, Zheng Yi, et al. Damage morphology change condition and thermal accumulation effect on high-reflection coatings at 1 064 nm[J]. Optics Express, 2014, 22(9): 10151-10156.

    [9] Liu Xiaofeng, Zhao Yuan′an, Li Dawei, et al. Characteristics of plasma scalds in multilayer dielectric films[J]. Applied Optics, 2011, 50(21): 4226-4231.

    [10] Liu X, Zhao Y, Gao Y, et al. Investigations on the catastrophic damage in multilayer dielectric films[J]. Applied Optics, 2013 52(10): 2194-2199.

    [11] Liu Zhichao, Chen Songlin, Luo Jin, et al. Studies of multipulse laser induced damage of HfO2/SiO2 multilayer at 1 064 nm [J]. Infrared and Laser Engineering, 2012, 41(5): 1191-1194.

    [12] Génin F Y, Stolz C J, Kozlowski M R. Growth of laser-induced damage during repetitive illumination of HfO2-SiO2 multilayer mirror and polarizer coatings[C]//SPIE, 1997, 2966: 273-282.

    [13] International Organization for Standardization. International Standard ISO 21254: lasers and laser-related equipment test methods for laser-induced damage threshold. part2: Threshold determination[S]. 2008.

    [14] Ciapponi A, Allenspacher P, Riede W, et al. S-on-1 testing of AR and HR designs at 1 064 nm[C]//SPIE, 2010, 7842: 78420J.

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    [1] Yu Xia, Xu Jiao, Zhang Bin. Thermal melting damage of thin film components induced by surface impurities and nodule defects[J]. Infrared and Laser Engineering, 2018, 47(12): 1243003

    Liu Zhichao, Zheng Yi, Pan Feng, Wang Zhen, Wang Jian, Xu Qiao. Effect of 1 064 nm laser conditioning on damage morphology change process on HfO2/SiO2 reflective film[J]. Infrared and Laser Engineering, 2017, 46(6): 606003
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