• Laser & Optoelectronics Progress
  • Vol. 58, Issue 15, 1516028 (2021)
Zhongtao Lin1, Lianchun Long1, Yang Yang2、*, and Wuguo Liu2
Author Affiliations
  • 1Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing 100124, China
  • 2Institute of Physics, Chinese Academy of Sciences, Beijing 100089, China
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    DOI: 10.3788/LOP202158.1516028 Cite this Article Set citation alerts
    Zhongtao Lin, Lianchun Long, Yang Yang, Wuguo Liu. Numerical Simulation of the Thermal Stresses of Layered Molybdenum Disulfide[J]. Laser & Optoelectronics Progress, 2021, 58(15): 1516028 Copy Citation Text show less

    Abstract

    In this study, the finite element method was used to simulate and analyze thermal stresses of molybdenum disulfide (MoS2). Two models with or without microsized holes on the substrate were developed to simulate the distribution of thermal stresses, and thermal stresses of the two models were compared. Relationships between thermal stresses and temperature, MoS2 layer thickness, and substrate thickness were analyzed. The thermal stress of the substrate supported MoS2 was larger than that of the suspended MoS2. Moreover, the thermal stress of the MoS2 surrounding the suspended MoS2 was higher than that of the suspended part. Our results demonstrate that the thermal stresses of MoS2 increased with decrease in temperature, decrease in MoS2 thickness, and increase in substrate thickness.
    Zhongtao Lin, Lianchun Long, Yang Yang, Wuguo Liu. Numerical Simulation of the Thermal Stresses of Layered Molybdenum Disulfide[J]. Laser & Optoelectronics Progress, 2021, 58(15): 1516028
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