• Acta Optica Sinica
  • Vol. 40, Issue 15, 1522002 (2020)
Shengsheng Sun1、2、**, Dan Wang1, Yuejing Qi1、2, and Mingcheng Zong1、2、*
Author Affiliations
  • 1Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • show less
    DOI: 10.3788/AOS202040.1522002 Cite this Article Set citation alerts
    Shengsheng Sun, Dan Wang, Yuejing Qi, Mingcheng Zong. Design of Reflective Projection Optics Used in Lithographic Focusing and Leveling System[J]. Acta Optica Sinica, 2020, 40(15): 1522002 Copy Citation Text show less
    Schematic of focusing and leveling sensor with reflective optical design
    Fig. 1. Schematic of focusing and leveling sensor with reflective optical design
    Schematic of reflective projection system
    Fig. 2. Schematic of reflective projection system
    Simulated projection grate and its imaging with different aberrations. (a) Projection grate; (b)imaging with no aberration; (c) imaging with 0.95 magnification; (d)imaging with 5 mrad tele-centricity; (e) imaging with 0.08 distortion; (f) imaging with 0.70 modulation transfer function (MTF)
    Fig. 3. Simulated projection grate and its imaging with different aberrations. (a) Projection grate; (b)imaging with no aberration; (c) imaging with 0.95 magnification; (d)imaging with 5 mrad tele-centricity; (e) imaging with 0.08 distortion; (f) imaging with 0.70 modulation transfer function (MTF)
    Measurement accuracy of system with different aberrations. (a) Magnification; (b) tele-centricity; (c) distortion; (d) MTF value
    Fig. 4. Measurement accuracy of system with different aberrations. (a) Magnification; (b) tele-centricity; (c) distortion; (d) MTF value
    Spot diagram of projection system
    Fig. 5. Spot diagram of projection system
    MTF curve of projection system
    Fig. 6. MTF curve of projection system
    Distortion of projection system
    Fig. 7. Distortion of projection system
    ParameterValue
    Field /(mm×mm)3×26
    Tele-centricity /mrad<0.2
    NA0.065
    Magnification-1±0.001
    Wavelength range /nm600-1000
    Distortion /%<0.01
    MTF(@33 lp/mm)>0.60
    Table 1. Requirement for system performance index
    ElementParameterValue /mm
    M1Semi-diameter70.000
    Radius384.389
    M2Semi-diameter20.000
    Radius192.182
    l1TTHI100.000
    l2TTHI289.381
    l3TTHI193.738
    l4TTHI193.738
    l5TTHI269.381
    l6TTHI120.000
    Table 2. Structure parameter of the system
    SurfaceRadius /mmTILTX/(°)TILTY/(°)DECX/mmDECY/mmIrregularity /fringePosition /mmAbbe /%
    M1±0.1±0.01±0.01±0.05±0.05±0.1±0.051.00
    M2±0.1±0.01±0.01±0.05±0.05±0.1±0.051.00
    Mirror1-±0.01±0.01--±0.1±0.05-
    Mirror2-±0.01±0.01--±0.1±0.05-
    Table 3. Tolerances distribution of the reflection projection system
    TypeObjectValue /mmCriterionChange
    TTHIl50.050.732679-0.00921
    TETYM1-0.010.735228-0.00666
    TSTYM1-0.010.735228-0.00666
    TETYM10.010.735408-0.00648
    TTHIl5-0.050.735733-0.00615
    TTHIl10.050.737226-0.00466
    TSDXM10.050.737690-0.00419
    TEDXM10.050.737690-0.00419
    TEDXM1-0.050.737799-0.00409
    TTHIl1-0.050.739291-0.00259
    Table 4. Effect of tolerances on MTF
    Percent /%MTF
    90>0.722339
    80>0.729696
    50>0.734511
    20>0.738964
    10>0.740203
    Table 5. Monte Carlo analysis results
    Shengsheng Sun, Dan Wang, Yuejing Qi, Mingcheng Zong. Design of Reflective Projection Optics Used in Lithographic Focusing and Leveling System[J]. Acta Optica Sinica, 2020, 40(15): 1522002
    Download Citation