The causes for beam-shaping of excimer laser in the application of lithography and the results of the beam spatial intensity profiles before and after shaping are expounded. The method of theoretical modeling-Gaussian-Schell model built-up for beam-shaping of excimer is also introduced. The advantages and defects,including the shaping capability,the energy loss,the interference effect,the control of wavefront and uniform distribution of amplitude,etc.,of beam-homogenizer such as microlens array and diffractive phase grating and so on used for lithographic beam-shaping are summarized and analyzed. Moreover,the principles,characteristics and progress of the beamshaper are brief reviewed.