Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference[J]. Acta Optica Sinica, 2018, 38(6): 0605001
- Acta Optica Sinica
- Vol. 38, Issue 6, 0605001 (2018)
Fig. 1. Schematic of SBIL system
Fig. 2. Relationship between beam waist radius and waist-to-substrate distance
Fig. 3. Diagram of single light path design
Fig. 4. Far-field interference of Gaussian beams
Fig. 5. Wavefront curvature distribution curve of Gaussian beam
Fig. 6. Nonlinear error distribution of phase without assembly error (unit of error data in curves is nm)
Fig. 7. Nonlinear error distribution of phase with waist-to-substrate assembly errors (unit of error data in curves is nm). (a) dR: -1 mm; (b) dR: -20 mm, dL: -20 mm; (c) dR: -21 mm, dL: -20 mm
Fig. 8. Nonlinear error distribution of phase with waist radius errors (unit of error data in curves is nm)
Fig. 9. Nonlinear error distribution of phase with two kind of assembly errors (unit of error data in curves is nm)
Fig. 10. Nonlinear error distribution of phase with worst assembly errors (unit of error data in curves is nm)
Fig. 11. Schematic of Gaussian beam through circular aperture
Fig. 12. Curves of approximate characteristics of Gaussian beam versus aperture radius
Fig. 13. Nonlinear error distribution of phase when ωo=37.05 μm (unit of error data in curves is nm)
Fig. 14. Nonlinear error distribution of phase when d=275 mm (unit of error data in curves is nm)
|
Table 1. Property changes of beams after passing through lens with a focal length of 175 nm
|
Table 2. Nonlinear error analysis results of phase of interference fringe
Set citation alerts for the article
Please enter your email address
© Copyright 2018-2021 | Chinese Laser Press. All Rights Reserved 沪ICP备15018463号-20