Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference

Sen Lu; Kaiming Yang; Yu Zhu; Leijie Wang; Ming Zhang

doi:10.3788/AOS201838.0605001

Journals >Acta Optica Sinica >Volume 38 >Issue 6 >Page 0605001 > Article

Acta Optica Sinica
Vol. 38, Issue 6, 0605001 (2018)

Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference

Sen Lu^1、2、*, Kaiming Yang^1、2、*, Yu Zhu^1、2, Leijie Wang^1、2, and Ming Zhang^1、2

Author Affiliations

¹ State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China

² Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipments and Control, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China

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DOI: 10.3788/AOS201838.0605001 Cite this Article Set citation alerts

Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference[J]. Acta Optica Sinica, 2018, 38(6): 0605001 Copy Citation Text

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