• Laser & Optoelectronics Progress
  • Vol. 57, Issue 9, 093101 (2020)
Jing Zhang1、**, Yubo Sun1、*, Xiuhua Fu1, Dongmei Liu1, Yining Mu2, and Shuang Li3
Author Affiliations
  • 1College of Photoelectric Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2College of Science, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 3Optorun (Shanghai) Co., Ltd., Shanghai 200444, China
  • show less
    DOI: 10.3788/LOP57.093101 Cite this Article Set citation alerts
    Jing Zhang, Yubo Sun, Xiuhua Fu, Dongmei Liu, Yining Mu, Shuang Li. Development of CMOS Optical Color Modulation Films for Low-Light-Level Systems[J]. Laser & Optoelectronics Progress, 2020, 57(9): 093101 Copy Citation Text show less

    Abstract

    In this study, we develop optical color modulation films in accordance with colorimetry to address the problem of low photon quantity observed in a low-light-level system. This system comprises a six-color filter, promoting color rendition. Further, we develop a data acquisition and iteration method model, which can be used to obtain the film design of the optical color modulation films by analyzing the spectral properties and combining the Essential Macleod film design software with the Mathcad engineering calculation software. The films are deposited via electron beam evaporation. Subsequently, we combine the quartz crystal deposition monitoring technology with the optical deposition monitoring technology to control the film thickness. Furthermore, optical color modulation films can be developed by performing inverse analysis with respect to film stacks. The obtained films pass the spectrum test and satisfy the application requirements.
    Jing Zhang, Yubo Sun, Xiuhua Fu, Dongmei Liu, Yining Mu, Shuang Li. Development of CMOS Optical Color Modulation Films for Low-Light-Level Systems[J]. Laser & Optoelectronics Progress, 2020, 57(9): 093101
    Download Citation