Three-Wavelength High-Reflectivity Film for All-Solid-State 355-nm Ultraviolet Laser

Qiuhui Zhuang; Sanqiang Wang

doi:10.3788/LOP202158.1924002

[1] Stolz C J, Sheehan L M, von Gunten M K et al. Advantages of evaporation of hafnium in a reactive environment for manufacture of high-damage-threshold multilayer coatings by electron-beam deposition[J]. Proceedings of SPIE, 3738, 318-324(1999).

[2] Neauport J, Lamaignere L, Bercegol H et al. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm[J]. Optics Express, 13, 10163-10171(2005).

[3] Yuan J M, Tang Z S, Qi H J et al. Optical constants and properties of several kinds of ultraviolet thin film materials[J]. Acta Optica Sinica, 23, 984-988(2003).

[4] Ashe B, Marshall K L, Giacofei C et al. Evaluation of cleaning methods for multilayer diffraction gratings[J]. Proceedings of SPIE, 6403, 64030O(2006).

[5] Li T T, Zhang M J, Tian K Z et al. Femtosecond laser-induced damage on Ge-Sb-S chalcogenide glass[J]. Acta Optica Sinica, 39, 1016001(2019).

[6] Zong H W, Zhao J S, Song X L et al. Development of research on damage characteristics of calcium fluoride crystal under deep ultraviolet laser irradiation[J]. Laser & Optoelectronics Progress, 56, 190002(2019).

[7] Mu W, Shen W D, Yang C Y et al. Preparation of anti-reflection coatings on quartz tube surfaces based on atomic layer deposition[J]. Acta Optica Sinica, 39, 0324001(2019).

[8] Wang Y, Hang L X. Study on the relationship between gradient of antireflection film and laser damage threshold[J]. Applied optics, 40, 151-157(2019).

[9] Yi P. Preparation and properties of laser damage resistant films[D](2015).