• Laser & Optoelectronics Progress
  • Vol. 58, Issue 19, 1924002 (2021)
Qiuhui Zhuang1、* and Sanqiang Wang2
Author Affiliations
  • 1College of Mechanical Engineering, Chongqing University of Technology, Chongqing 400050, China
  • 2State Grid Chongqing Electric Power Company Marketing Service Center, Chongqing 400020, China
  • show less
    DOI: 10.3788/LOP202158.1924002 Cite this Article Set citation alerts
    Qiuhui Zhuang, Sanqiang Wang. Three-Wavelength High-Reflectivity Film for All-Solid-State 355-nm Ultraviolet Laser[J]. Laser & Optoelectronics Progress, 2021, 58(19): 1924002 Copy Citation Text show less
    Spectral curve of membrane system
    Fig. 1. Spectral curve of membrane system
    Test spectral curve of thin film
    Fig. 2. Test spectral curve of thin film
    Laser damage threshold of different substrate materials and cleaning process
    Fig. 3. Laser damage threshold of different substrate materials and cleaning process
    Damage morphology under different working vacuum. (a) 7×10-3 Pa; (b) 9×10-3 Pa; (c) 2×10-2 Pa; (d) 3×10-2 Pa
    Fig. 4. Damage morphology under different working vacuum. (a) 7×10-3 Pa; (b) 9×10-3 Pa; (c) 2×10-2 Pa; (d) 3×10-2 Pa
    Weak absorption values of film samples under different working vacuum
    Fig. 5. Weak absorption values of film samples under different working vacuum
    Laser damage threshold of thin film samples under different working vacuum
    Fig. 6. Laser damage threshold of thin film samples under different working vacuum
    MethodS11S12S13S14
    Cleaning methodSconcentration of acidoaking in certainDeionized water heating ultrasonic cleaningSconcentration of acidoaking in certainDeionized water heating ultrasonic cleaning
    Substrate materialQuartzQuartzK9K9
    Table 1. Method for preparing group Ⅰ samples
    MethodS21S22S23S24
    Working vacuum /Pa7×10-39×10-32×10-23×10-2
    Table 2. Method for preparing group Ⅱ samples
    Qiuhui Zhuang, Sanqiang Wang. Three-Wavelength High-Reflectivity Film for All-Solid-State 355-nm Ultraviolet Laser[J]. Laser & Optoelectronics Progress, 2021, 58(19): 1924002
    Download Citation