• Laser & Optoelectronics Progress
  • Vol. 61, Issue 9, 0914002 (2024)
Guanqun Yu1,2, Lü Baiying1, Yue Xu1, Zhongming Zeng1, and Dongmin Wu1,2,*
Author Affiliations
  • 1Nano-Fabrication Facility, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, Jiangsu , China
  • 2School of Material Science and Technology, ShanghaiTech University, Shanghai 201210, China
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    DOI: 10.3788/LOP231088 Cite this Article Set citation alerts
    Guanqun Yu, Lü Baiying, Yue Xu, Zhongming Zeng, Dongmin Wu. Exposure Time Optimization of Laser Interference Direct Writing Device Based on MEMS Micromirror[J]. Laser & Optoelectronics Progress, 2024, 61(9): 0914002 Copy Citation Text show less

    Abstract

    Laser interference direct writing device constructed with MEMS (microelectro mechanical systems) micromirrors has advantages such as small size, fast writing speed and simple optical path. However, it is necessary to adjust the exposure time to achieve uniform exposure effect during scanning. We introduce the optical path composition and control method of this type of laser interference direct writing device. The lookup table method is used to optimize the generated exposure pattern and exposure time parameters, reducing the pixel diameter variation from about 84% to about 6%. It solves the problem of uneven exposure time in the application of laser interference direct writing devices based on MEMS micromirrors.
    Guanqun Yu, Lü Baiying, Yue Xu, Zhongming Zeng, Dongmin Wu. Exposure Time Optimization of Laser Interference Direct Writing Device Based on MEMS Micromirror[J]. Laser & Optoelectronics Progress, 2024, 61(9): 0914002
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