Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang, Jin Yang. Design and Control of Ultra-Precision Fine Positioning Stage for Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2017, 37(10): 1012006
- Acta Optica Sinica
- Vol. 37, Issue 10, 1012006 (2017)
Fig. 1. SBIL system
Fig. 2. Scanning and step exposure process of SBIL
Fig. 3. Fringe phase-locking control principle
Fig. 4. Schematic diagram of the Fourier transform of D1(x)
Fig. 5. Exposure contrast versus period measurement error
Fig. 6. Schematic diagram of coarse-fine dual stage structure
Fig. 7. Block diagram of coarse-fine dual stage docking scheme
Fig. 8. Internal structure diagram of fine positioning stage
Fig. 9. System overview of fine positioning stage
Fig. 10. Three degree of freedom decoupling control block diagram of fine positioning stage
Fig. 11. Identified and fitted results of x degree of freedom model
Fig. 12. Bode diagram of open loop transfer function
Fig. 13. Positioning errors in degrees of freedom of x,y,θz with close-loop control
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Table 1. Statistics of positioning error in x,y,θz
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