[1] McClelland J J, Scholten R E, Palm E C, et al.. Laser focused atomic deposition[J]. Science, 1993, 262(5): 877-880.

[2] Li Tongbao. Nanometrology and transfer standard[J]. Shanghai Measurement and Testing, 2005, 1(185): 8-13.

[3] McClelland J J, Anderson W R, Bradley C C, et al.. Accuracy of nanoscale pith standards fabribcated by laser-focused atomic deposition[J]. J Res Natl Inst Stand Technol, 2003, 108(2): 99-113.

[4] Zhang Wentao, Zhu Baohua, Huang Jing, et al.. Chromium atom deposition in elliptical standing wave field[J]. Acta Phys Sin, 2011, 60(10): 103203.

[5] Zhang Pingping, Ma Yan, Li Tongbao. Optimization of particle optics model for one-dimentional atom lithography[J]. Acta Optica Sinica, 2011, 31(5): 0514004.

[6] Zhang Pingping, Ma Yan, Zhang Baowu, et al.. Properties of 3D nanostructures fabricated by laser-focused Cr atomic deposition[J]. Acta Optica Sinica, 2011, 31(11): 1114001.

[7] Chen Sheng, Ma Yan, Zhang Pingping, et al.. Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field[J]. Chin Phys B, 2014, 23(2): 020301.

[8] Zhang Baowu, Ma Yan, Zhang Pingping, et al.. Effects of substrate diffraction on evolution of the atom wave-packet probability density in the focused laser standing wave[J]. Acta Optica Sinica, 2012, 32(12): 1205003.

[9] Zhang Baowu, Zhang Wentao, Wang Daodang, et al.. Effects of substrate position on laser- focused Cr atom deposition[J]. Acta Optica Sinica, 2014, 34(8): 0805002.

[10] McClelland J J. Atom-optical properties of a standing-wave light field[J]. JOSA B, 1995, 12(10): 1761-1768.