• Journal of Semiconductors
  • Vol. 45, Issue 9, 092403 (2024)
Yuanzhi Cui1,2, Hongyue Hao2,3,*, Shihao Zhang2, Shuo Wang2..., Jing Zhang1, Yifan Shan2,3, Ruoyu Xie2,3, Xiaoyu Wang1, Chuang Wang1, Mengchen Liu1, Dongwei Jiang2,3, Yingqiang Xu2,3, Guowei Wang2,3, Donghai Wu2,3, Zhichuan Niu2,3 and Derang Cao1|Show fewer author(s)
Author Affiliations
  • 1College of Physics, National Demonstration Center for Experimental Applied Physics Education, Qingdao University, Qingdao 266071, China
  • 2Key Laboratory of Optoelectronic Materials and Devices, Chinese Academy of Sciences, Beijing 100083, China
  • 3College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.1088/1674-4926/24040024 Cite this Article
    Yuanzhi Cui, Hongyue Hao, Shihao Zhang, Shuo Wang, Jing Zhang, Yifan Shan, Ruoyu Xie, Xiaoyu Wang, Chuang Wang, Mengchen Liu, Dongwei Jiang, Yingqiang Xu, Guowei Wang, Donghai Wu, Zhichuan Niu, Derang Cao. High-performance GaSb planar PN junction detector[J]. Journal of Semiconductors, 2024, 45(9): 092403 Copy Citation Text show less
    (Color online) (a) The process of planar structure photodiode fabrication through diffusion and the final device structure. (b) SEM diagram of the fabricated devices.
    Fig. 1. (Color online) (a) The process of planar structure photodiode fabrication through diffusion and the final device structure. (b) SEM diagram of the fabricated devices.
    (Color online) (a) SIMS test results. (b) The relationship between diffusion depth and diffusion temperature.
    Fig. 2. (Color online) (a) SIMS test results. (b) The relationship between diffusion depth and diffusion temperature.
    (Color online) (a) The cross-section TEM image and (b) mapping energy spectrum of fabricated planar PN junction detector.
    Fig. 3. (Color online) (a) The cross-section TEM image and (b) mapping energy spectrum of fabricated planar PN junction detector.
    (Color online) Simulation result of band structure based on SIMS data with a diffusion temperature of (a) 450 °C and (b) 550 °C.
    Fig. 4. (Color online) Simulation result of band structure based on SIMS data with a diffusion temperature of (a) 450 °C and (b) 550 °C.
    (Color online) The relationship between dark current density and bias at different temperatures for devices with diffusion temperatures of 450 and 550 °C.
    Fig. 5. (Color online) The relationship between dark current density and bias at different temperatures for devices with diffusion temperatures of 450 and 550 °C.
    (Color online) The dark current mechanism of samples diffused at 450 and 550 °C.
    Fig. 6. (Color online) The dark current mechanism of samples diffused at 450 and 550 °C.
    Performance curve and wavelength of the photodiode with a diffusion temperature of (a) 550 °C and (b) 450 °C.
    Fig. 7. Performance curve and wavelength of the photodiode with a diffusion temperature of (a) 550 °C and (b) 450 °C.
    Infrared radiation imaging of (a) electric soldering iron and (b) lighter flame.
    Fig. 8. Infrared radiation imaging of (a) electric soldering iron and (b) lighter flame.
    Diffusion temperature (°C)Test temperature (K)R0A (Ω·cm2)η (%)D* (cm·Hz1/2/W)
    45030030.31.71.27 × 109
    550300133.560.38.73 × 1010
    Table 1. Performance comparison of planar junction detectors at different diffusion temperatures.
    Yuanzhi Cui, Hongyue Hao, Shihao Zhang, Shuo Wang, Jing Zhang, Yifan Shan, Ruoyu Xie, Xiaoyu Wang, Chuang Wang, Mengchen Liu, Dongwei Jiang, Yingqiang Xu, Guowei Wang, Donghai Wu, Zhichuan Niu, Derang Cao. High-performance GaSb planar PN junction detector[J]. Journal of Semiconductors, 2024, 45(9): 092403
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