• Acta Optica Sinica
  • Vol. 38, Issue 10, 1014001 (2018)
Jida Hou1、2、*, Cong Xiong2、*, Qiong Qi2, Suping Liu2, and Xiaoyu Ma2
Author Affiliations
  • 1 University of Chinese Academy of Sciences, Beijing 100049, China
  • 2 National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
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    DOI: 10.3788/AOS201838.1014001 Cite this Article Set citation alerts
    Jida Hou, Cong Xiong, Qiong Qi, Suping Liu, Xiaoyu Ma. Optimization Design of Epitaxially-Stacked Multiple-Active-Region Lasers[J]. Acta Optica Sinica, 2018, 38(10): 1014001 Copy Citation Text show less

    Abstract

    Based on separated asymmetric large optical cavity, the high power pulsed semiconductor lasers with epitaxially-stacked three-active-region structure at laser central wavelength of 905 nm are investigated. We optimize the critical parameters, including near-field optical intensity model, free-carrier absorption loss, the distance between adjacent luminescent regions and the doping levels of each layer, to obtain higher peak output power, lower internal optical loss and smaller far-field vertical divergence angle. A three-active-region high power semiconductor laser with 1 mm cavity length and 100 μm stripe width is developed. We achieve a peak output power of 122 W driven by 34.5 A pulse current intensity at 150 ns pulse width and 6.67 kHz repetition rate. Slope efficiency of 3.54 W/A, equivalent internal quantum efficiency of 91.75% and internal optical loss of 2.05 cm -1 for each emitter are obtained, and far-field divergence angles of 7.8° and 27.6° (full width at half maximum) are achieved in the lateral and vertical directions, respectively.
    Jida Hou, Cong Xiong, Qiong Qi, Suping Liu, Xiaoyu Ma. Optimization Design of Epitaxially-Stacked Multiple-Active-Region Lasers[J]. Acta Optica Sinica, 2018, 38(10): 1014001
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