• Laser & Optoelectronics Progress
  • Vol. 49, Issue 5, 51601 (2012)
Wang Xuerong*, Wei Liping, Zheng Huibao, Liu Yunchuan, Zhou Yanping, and Meng Xiangyan
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/lop49.051601 Cite this Article Set citation alerts
    Wang Xuerong, Wei Liping, Zheng Huibao, Liu Yunchuan, Zhou Yanping, Meng Xiangyan. Al Contents of AlxGa1-xN Epitaxial Films Studied by Photoluminescence Technique[J]. Laser & Optoelectronics Progress, 2012, 49(5): 51601 Copy Citation Text show less

    Abstract

    Deep-ultraviolet photoluminescence technique is used to investigate the band gaps of AlxGa1-xN epitaxial films. The bowing parameter of AlxGa1-xN is studied by CASTEP module of Material Studio simulation software and the Al molar fractions of AlxGa1-xN epitaxial films are researched. The result shows that the HeAg laser with 224.3 nm emission wavelength can make AlxGa1-xN material produce luminescence. The bowing parameter of AlxGa1-xN epitaxial film is calculated with CASTEP software simulation to be 1.01462±0.06772 eV, from which we can calculate the Al molar fractions of AlxGa1-xN epitaxial films.
    Wang Xuerong, Wei Liping, Zheng Huibao, Liu Yunchuan, Zhou Yanping, Meng Xiangyan. Al Contents of AlxGa1-xN Epitaxial Films Studied by Photoluminescence Technique[J]. Laser & Optoelectronics Progress, 2012, 49(5): 51601
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