Fig. 1. Silicon nitride microring cavity produces hybrid dispersion by a nano-scale silica slot.

Fig. 2. By increasing the thickness of the top Si3N4 layer, the dispersion profile is tailored, with more normal dispersion occurring within the low-dispersion band. The vertical lines indicate pump locations for Fig. 6.

Fig. 3. Frequency dependences of the coupling coefficient, round-trip loss, and loaded Q-factor are shown in (a) and (b).

Fig. 4. Existence of KSS and SRS increases cavity soliton pulsewidth, and a higher pump power is required to obtain the same pulsewidth.

Fig. 5. Cavity soliton pulsewidth varies with pump power for different dispersion profiles that have increasingly more normal dispersion from WG1 to WG4 with (a) AOD only and (b) all perturbations. (c) Required pump power to produce a certain cavity soliton pulsewidth depends on the second-order dispersion value.

Fig. 6. Intra-cavity temporal waveforms with the pump placed at different wavelengths, as shown in Fig. 2, in a cavity formed with (a) WG3 and (b) WG4. The associated spectra are shown in (c) and (d).