Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine

Weilin Cheng; Fang Zhang; Dongliang Lin; Aijun Zeng; Baoxi Yang; Huijie Huang

doi:10.3788/AOS201838.1022004

Journals >Acta Optica Sinica >Volume 38 >Issue 10 >Page 1022004 > Article

Acta Optica Sinica
Vol. 38, Issue 10, 1022004 (2018)

Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine

Weilin Cheng^1、2、*, Fang Zhang¹, Dongliang Lin^1、2, Aijun Zeng^1、2, Baoxi Yang^1、2, and Huijie Huang^1、2、*

Author Affiliations

¹ Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/AOS201838.1022004 Cite this Article Set citation alerts

Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. Multi-Degree-of-Freedom Uniformity Correction Method of Illumination System in Lithography Machine[J]. Acta Optica Sinica, 2018, 38(10): 1022004 Copy Citation Text

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