A multi-degree-of-freedom uniformity correction method of the illumination system in a lithography machine is proposed. When the partial coherence factor of the illumination pupil changes, the fine tuning of the whole correction fingers along the direction of the optical axis in the proposed method is enough to make the light illumination uniformity meet the requirements. The effect of the three-dimensional spatial movement of correction fingers on the light illumination uniformity is analyzed by simulation, and the high efficiency of this method is verified.