Influence of Sputtering Power on Optical Quality of Thin Film

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 22 >Issue 11 >Page 1300 > Article

Acta Optica Sinica
Vol. 22, Issue 11, 1300 (2002)

Influence of Sputtering Power on Optical Quality of Thin Film

[in Chinese]^1、*, [in Chinese]¹, [in Chinese]¹, [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of Sputtering Power on Optical Quality of Thin Film[J]. Acta Optica Sinica, 2002, 22(11): 1300 Copy Citation Text

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References

[1] Vernon S P, Stearns D G, Rosen B S. Ion-assisted sputter deposition of molybdenum-silicon multilayers. Appl. Opt., 1993, 32(34):6969～6974

[2] Boher P, Houdy Ph, Hennet L et al.. Magnesium silicide based multilayers for soft X-ray optics. Proc. SPIE, 1991, 1546:502～518

[3] Stearns D G, Rose R S, Verns S P. Multiplayer mirror technology for soft X-ray projection lithography. Appl. Opt., 1993, 32(34):6952～6960

[4] Siaughter J M, Schulze D W. Structure and performance of Mo/Si multiplayer mirrors for the extreme ultraviolet. J. Appl. Phys., 1994, 76(4):2144～2154

[5] England C D, Bennett W R, Falco C M. Magnetic and structural characterization of copper/cobat multilayers. J. Appl. Phys., 1988, 64(10):15～20

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of Sputtering Power on Optical Quality of Thin Film[J]. Acta Optica Sinica, 2002, 22(11): 1300

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