The thin films were fabricated by varying the magnetron sputtering power in order to investigate the influence of the sputtering power on the structure of thin films. The results show that the thin film deposited at very low power has the distorted XRD charateristic peaks with low intensity and the large width of half peak, while the films deposited at high power show the sharp characteristic peak. The related investigations illustrate that the thin film deposited with low power has the loose structure, and that with high power has coherent structure.