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    Journals >Chinese Journal of Lasers >Volume 51 >Issue 12 >Page 1202410 > Article
    • Chinese Journal of Lasers
    • Vol. 51, Issue 12, 1202410 (2024)
    Research Progress of High‐Resolution Direct Laser Writing Lithography Based on Phase Change Thin Film (Invited)
    Jialong Guo1, Tao Wei1,*, Jingsong Wei2,**, Jing Hu1..., Miao Cheng1, Qianqian Liu1, Ruirui Wang1, Wanfei Li1 and Bo Liu1,***|Show fewer author(s)
    Author Affiliations
  • 1Suzhou Key Laboratory for Nanophotonic and Nanoelectronic Materials and Its Devices, School of Materials Science and Engineering, Suzhou University of Science and Technology, Suzhou 215009, Jiangsu , China
  • 2Laboratory of Micro-Nano Optoelectronic Materials and Devices, Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences, Shanghai 201800, China
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    DOI: 10.3788/CJL240577 Cite this Article Set citation alerts
    Jialong Guo, Tao Wei, Jingsong Wei, Jing Hu, Miao Cheng, Qianqian Liu, Ruirui Wang, Wanfei Li, Bo Liu. Research Progress of High‐Resolution Direct Laser Writing Lithography Based on Phase Change Thin Film (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202410 Copy Citation Text show less
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    Article index updated: Jul. 15, 2025
    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
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    Jialong Guo, Tao Wei, Jingsong Wei, Jing Hu, Miao Cheng, Qianqian Liu, Ruirui Wang, Wanfei Li, Bo Liu. Research Progress of High‐Resolution Direct Laser Writing Lithography Based on Phase Change Thin Film (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202410
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    Paper Information
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