• Chinese Optics Letters
  • Vol. 8, Issue s1, 78 (2010)
Hua Shen1, Rihong Zhu1, Qing Wang1, and Linhua Xu2
Author Affiliations
  • 1School of Electronic Engineering and Photo-electric Technology, Nanjing University of Science and Technology, Nanjing 210094, China
  • 2School of Science, Nanjing University of Science and Technology, Nanjing 210094, China
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    DOI: 10.3788/COL201008s1.0078 Cite this Article Set citation alerts
    Hua Shen, Rihong Zhu, Qing Wang, Linhua Xu. Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation[J]. Chinese Optics Letters, 2010, 8(s1): 78 Copy Citation Text show less
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    Hua Shen, Rihong Zhu, Qing Wang, Linhua Xu. Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation[J]. Chinese Optics Letters, 2010, 8(s1): 78
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