• Chinese Journal of Lasers
  • Vol. 51, Issue 7, 0701011 (2024)
Kui Li1、4, Runyu Meng2、3, Ruixuan Li1、4, Guangyin Zhang1、4, Mingjie Yao5, Hao Xu1, Yutong Wang1, Jie Li1、4、***, Xiaoshi Zhang1、2、**, and Zhongwei Fan4、*
Author Affiliations
  • 1Aerospace Information Research Institute, Chinese Academy of Sciences, Beijing 100094, China
  • 2School of Physics and Astronomy, Yunnan University, Kunming 650216, Yunnan, China
  • 3Yunnan Observatories, Chinese Academy of Sciences, Kunming 650216, Yunnan, China
  • 4School of Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, China
  • 5School of Instrumentation and Optoelectronic Engineering, Beihang University, Beijing 100191,China
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    DOI: 10.3788/CJL231507 Cite this Article Set citation alerts
    Kui Li, Runyu Meng, Ruixuan Li, Guangyin Zhang, Mingjie Yao, Hao Xu, Yutong Wang, Jie Li, Xiaoshi Zhang, Zhongwei Fan. High Power and High Stability 13.5 nm Extreme Ultraviolet Light Source Driven by High‑Order Harmonics[J]. Chinese Journal of Lasers, 2024, 51(7): 0701011 Copy Citation Text show less
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    Kui Li, Runyu Meng, Ruixuan Li, Guangyin Zhang, Mingjie Yao, Hao Xu, Yutong Wang, Jie Li, Xiaoshi Zhang, Zhongwei Fan. High Power and High Stability 13.5 nm Extreme Ultraviolet Light Source Driven by High‑Order Harmonics[J]. Chinese Journal of Lasers, 2024, 51(7): 0701011
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