Kui Li, Runyu Meng, Ruixuan Li, Guangyin Zhang, Mingjie Yao, Hao Xu, Yutong Wang, Jie Li, Xiaoshi Zhang, Zhongwei Fan. High Power and High Stability 13.5 nm Extreme Ultraviolet Light Source Driven by High‑Order Harmonics[J]. Chinese Journal of Lasers, 2024, 51(7): 0701011
- Chinese Journal of Lasers
- Vol. 51, Issue 7, 0701011 (2024)
Fig. 1. Schematics of experimental setup. (a) Ti∶sapphire light source system; (b) beam stability control system; (c) EUV generation and filtration system; (d) EUV light source detection and spectrometer system
Fig. 2. Schematics of high-order harmonic optical power measurement. (a) EUV light power measurement system and pointing stability measurement system; (b) harmonic spot collected at 1.9 m from light source
Fig. 3. Power stability and pointing stability test results. (a) Average power curve of beam within 12 h; (b) coordinate of center of HHG spot collected by CMOS
Fig. 4. Results of spectral acquisition and analysis. (a) Schematic of spectral acquisition device; (b) spectral calibration analysis results of gratings with groove density of 500 line/mm
Fig. 5. Grating spectral results. (a) First-order spectral information collected by CMOS; (b) extracted first-order spectral information
Fig. 6. HHG spectral distributions acquired by grating with groove density of 500 line/mm. (a) Theoretical absolute grating efficiency; (b) harmonic spectra obtained from measurement
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