Technology development for ultraintense all-OPCPA systems

J. Bromage; S.-W. Bahk; I. A. Begishev; C. Dorrer; M. J. Guardalben; B. N. Hoffman; J. B. Oliver; R. G. Roides; E. M. Schiesser; M. J. Shoup; M. Spilatro; B. Webb; D. Weiner; J. D. Zuegel

doi:10.1017/hpl.2018.64

Journals >High Power Laser Science and Engineering >Volume 7 >Issue 1 >Page 010000e4 > Article

High Power Laser Science and Engineering
Vol. 7, Issue 1, 010000e4 (2019)

Technology development for ultraintense all-OPCPA systems | Editors' Pick

J. Bromage^*, S.-W. Bahk, I. A. Begishev, C. Dorrer..., M. J. Guardalben, B. N. Hoffman, J. B. Oliver, R. G. Roides, E. M. Schiesser, M. J. Shoup, M. Spilatro, B. Webb, D. Weiner and J. D. Zuegel|Show fewer author(s)

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Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14623-1299, USA

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DOI: 10.1017/hpl.2018.64 Cite this Article Set citation alerts

J. Bromage, S.-W. Bahk, I. A. Begishev, C. Dorrer, M. J. Guardalben, B. N. Hoffman, J. B. Oliver, R. G. Roides, E. M. Schiesser, M. J. Shoup, M. Spilatro, B. Webb, D. Weiner, J. D. Zuegel, "Technology development for ultraintense all-OPCPA systems," High Power Laser Sci. Eng. 7, 010000e4 (2019) Copy Citation Text

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