• Chinese Journal of Lasers
  • Vol. 47, Issue 1, 0106003 (2020)
Jian Sun1、2, Yuanda Wu2, Weifeng Wu2, and Chongxin Shan1、*
Author Affiliations
  • 1School of Physics, Zhengzhou University, Zhengzhou, Henan 450001, China
  • 2Henan Shijia Photons Technology Co., Ltd., Hebi, Henan 458030, China
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    DOI: 10.3788/CJL202047.0106003 Cite this Article Set citation alerts
    Jian Sun, Yuanda Wu, Weifeng Wu, Chongxin Shan. Optimization of Polarization-Dependent Loss of Arrayed Waveguide Grating Demultiplexer[J]. Chinese Journal of Lasers, 2020, 47(1): 0106003 Copy Citation Text show less
    Fabrication process of AWG chip
    Fig. 1. Fabrication process of AWG chip
    Morphology photos of rectangular waveguide. (a) Optical microscope photograph; (b) SEM image
    Fig. 2. Morphology photos of rectangular waveguide. (a) Optical microscope photograph; (b) SEM image
    Relation between film properties and gas flow. (a) Refractive index of film and deposition rate versus gas flow of B2H6/PH3; (b) relation between film stress and gas flow of B2H6/PH3
    Fig. 3. Relation between film properties and gas flow. (a) Refractive index of film and deposition rate versus gas flow of B2H6/PH3; (b) relation between film stress and gas flow of B2H6/PH3
    Diagram of testing system of chip
    Fig. 4. Diagram of testing system of chip
    Relation between polarization characteristics of chip and gas flow. (a) PDL and transmission spectrum versus gas flow; (b) output spectra of AWG with high doped cladding
    Fig. 5. Relation between polarization characteristics of chip and gas flow. (a) PDL and transmission spectrum versus gas flow; (b) output spectra of AWG with high doped cladding
    Relation between PDW of chip and gas flow of B2H6/PH3
    Fig. 6. Relation between PDW of chip and gas flow of B2H6/PH3
    Relation between adjacent channel crosstalk and gas flow of B2H6/PH3
    Fig. 7. Relation between adjacent channel crosstalk and gas flow of B2H6/PH3
    Relation between PDL of chip and over etching depth
    Fig. 8. Relation between PDL of chip and over etching depth
    Jian Sun, Yuanda Wu, Weifeng Wu, Chongxin Shan. Optimization of Polarization-Dependent Loss of Arrayed Waveguide Grating Demultiplexer[J]. Chinese Journal of Lasers, 2020, 47(1): 0106003
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