• Infrared and Laser Engineering
  • Vol. 49, Issue 8, 20190559 (2020)
Yu Zhang1, Zhongming Yang1, Zhaojun Liu1, and Jihong Wang2
Author Affiliations
  • 1School of Information Science and Engineering, Shandong University, Qingdao 366237, China
  • 2The Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610206, China
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    DOI: 10.3788/IRLA20190559 Cite this Article
    Yu Zhang, Zhongming Yang, Zhaojun Liu, Jihong Wang. Design of large aperture multi-spectra channel wavefront measurement system[J]. Infrared and Laser Engineering, 2020, 49(8): 20190559 Copy Citation Text show less

    Abstract

    With the development of wavefront measurement technology, the large aperture and multi-spectra channel wavefront measurement system had become a research hotspot in the field of wavefront measurement. The large aperture and multi-spectra channel wavefront measurement system was mainly composed of fore RC shrink-beam system, dimming component, beam splitters and wavefront sensors.The system with an effective aperture of 450 mm had working wavelengths of 0.5-0.8 μm, 0.9-1.7 μm and 3-5 μm. The design parameters of the optical system were given, the selection of optical element parameters in the system was described. The modeling and simulation of the optical system were completed by Zemax. The design scheme of the mechanical system was finished, and integrated optical-mechanical-thermal analysis of the system were completed. The parameters of the large aperture and multi-spectra channel wavefront measurement system are tested, the results show that the effective aperture of the wavefront measurement system is larger than 450 mm, at the environment of -10-50 ℃, the system can measure wavefronts in the visible, near-infrared, and mid-infrared bands with high precision and stability, the stability of the wavefront measurement system is better than 0.05λ (RMS, λ=532 nm).
    Yu Zhang, Zhongming Yang, Zhaojun Liu, Jihong Wang. Design of large aperture multi-spectra channel wavefront measurement system[J]. Infrared and Laser Engineering, 2020, 49(8): 20190559
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