[2] Cevro M.Ion-beam spunering of(Ta2O5)-(SiO2)1-x composite thin films[J].Thin Solid Films,1995,258:91-103

[4] Darko Makovec,Jian-Min Zuo,Ray Twesten,et al.A high-temperature structure for Ta2O5 with modulations by TiO2 substitution[J].Journal of Solid State Chemistry,2006,179:1782-1791

[5] Swanepoel R.Determination of the thickness and optical constants of amorphous silicon[J].J Phys E:Sci Instrum,1983,16:1214-1222

[7] Corbella C,Vives M,Pinyol A,et al.Influence of the porosity of RF sputtered Ta2O5 thin films on their optical properties for electrochromic applications[J].Solid State Ionics,2003,165:15-22

[8] Never Kaliwoh,Jun-Ying Zhang,Ian W Boyd.(Ta2O5)1-x(TiO2)x deposited by photo-induced CVD using 222nm excimer lamps[J].Applied Surface Science,2002,186:246-250

[9] Chen J Y.Leng Y X,Tian X B,et al.Antithrombogenic investigation of surface energy and optical baodgap and hemocompatibility mechanism of Ti(Ta+3)O2 thin films[J].Biomaterials,2002,23:2545-2552

[10] Ekimov A I,Efros A L,Onushchenko A A.Quantum size effect in semiconductor microcrystals[J].Solid State Commun,1985,56(11):921-924