[1] A. Erdmann, M. Arnz. The impact of aberration averaging during step-and-scan on the photolithographic process［J］ . Microelectron. Eng., 1998, 41(42): 117～120

[2] Ma Mingying, Wang Xiangzhao, Wang Fan et al.. Novel method for measuring coma with fine overlay test marks［J］. Acta Optica Sinica, 2006, 26(7): 1037～1042

[3] P. Graeupner, R. B. Garreis, A. Goehnermeier et al.. Impact of wavefront errors on low kl processes at extremely high NA［C］. SPIE, 2003, 5040: 119～130

[4] Wang Fan, Wang Xiangzhao, Ma Mingying et al.. On-site coma measurement technique based on linewidth asymmetry of the aerial image［J］. Acta Optica Sinica, 2006, 26(5): 673～678

[5] B. Peng, X. Wang, Z. Qiu et al.. Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging［J］. Opt. Lett., 2010, 35(9): 1404～1406

[6] H. van der Laan, M. Dierichs, H. van Greevenbroek et al.. Aerial image measurement methods for fast aberration set-up and illumination pupil verification［C］. SPIE, 2001, 4346: 394～407

[7] Z. Qiu, X. Wang, Q. Yuan et al.. Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width［J］. Appl. Opt., 2009, 48(2): 261～269

[8] T. Hagiwara, N. Kondo, I. Hiroshi et al.. Development of aerial image based aberration measurement technique［C］. SPIE, 2005, 5754: 1659～1669

[9] W. Liu, S. Liu, T. Zhou et al.. Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination［J］. Opt. Express, 2009, 17(21): 19278～19291

[10] R. Miyakawa, P. Naulleau. Aerial image monitor for wavefront metrology of high-resolution EUV lithography tools［C］. SPIE, 2012, 8322(18): 1～7

[11] L. Duan, X. Wang, A. Bourov et al.. In situ aberration measurement technique based on principal component analysis of aerial image［J］. Opt. Express, 2011, 19(19): 18080～18090

[12] L. Duan, X. Wang, G. Yan et al.. Practical application of AMAI-PCA to measure wavefront aberration of lithographic lens［J］. J. Micro/Nanolithography, MEMS, and MOEMS (JM3), 2012, 11(2): 023009

[13] J. O. Rawlings, S. G. Pantula, D. A. Dickey. Applied Regression Analysis: A Research Tool［M］. New York: Springer-Verlag Press, 2nd ed. 1998. 411～417

[14] R. C. Gonzalez, R. E. Woods. Digital Image Processing［M］. New Jersey: Prentice Hall Press, 3rd ed. 2008. 93～97

[15] G. Box, D. Behnken. Some new three level designs for the study of quantitative variables［J］. Technometrics, 1960, 2(4): 455～475

[16] KLA-Tencor. Software package Prolith v8.0.3

[17] I. T. Jolliffe. Principal Component Analysis［M］. New York: Springer Press, 2nd ed. 2002. 150～165