Exposure Fusion Based on Improved Exposure Evaluation and Double Pyramids

Lingfeng Wu; Junbao Hu; Chang Yuan

doi:10.3788/LOP202158.1410005

Journals >Laser & Optoelectronics Progress >Volume 58 >Issue 14 >Page 1410005 > Article

Laser & Optoelectronics Progress
Vol. 58, Issue 14, 1410005 (2021)

Exposure Fusion Based on Improved Exposure Evaluation and Double Pyramids

Lingfeng Wu^1、**, Junbao Hu^2、*, and Chang Yuan³

Author Affiliations

¹College of Mechanical and Electrical Engineering, Guangdong University of Science and Technology, Dongguan, Guangdong 523083, China

²Institute of Micro-Nano Optoelectronics, Shenzhen University, Shenzhen, Guangdong 518060, China

³School of Materials Science & Engineering, Beijing Institute of Technology, Beijing 100081, China;

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DOI: 10.3788/LOP202158.1410005 Cite this Article Set citation alerts

Lingfeng Wu, Junbao Hu, Chang Yuan. Exposure Fusion Based on Improved Exposure Evaluation and Double Pyramids[J]. Laser & Optoelectronics Progress, 2021, 58(14): 1410005 Copy Citation Text

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Fig. 1. EF flow chart of our method

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Fusion results of different methods on the house sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method

Fig. 2. Fusion results of different methods on the house sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method

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Fig. 3. Fusion results of different methods on the garage sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method

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Fig. 4. Fusion results of different methods on the memorial sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method

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Fig. 5. Fusion results of different methods on the chandelier sequence. (a) Original image; (b) WM method; (c) EE method; (d) LP method; (e) DL method; (f) EEF method; (g) our method

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Sequence	Method	SF	IE	AG	NIQE	SSEQ
house	WM	0.044	7.429	0.014	23.531	33.486
	EE	0.058	7.331	0.033	25.124	32.325
	LP	0.085	7.496	0.036	23.145	28.229
	DL	0.050	7.586	0.016	22.652	30.999
	EEF	0.088	7.489	0.040	19.103	25.739
	ours	0.097	7.591	0.042	21.898	25.182
garage	WM	0.068	7.267	0.019	24.312	27.861
	EE	0.107	7.194	0.034	30.623	33.325
	LP	0.101	7.418	0.031	25.718	21.325
	DL	0.109	7.382	0.028	28.354	30.495
	EEF	0.093	7.441	0.032	25.601	20.333
	ours	0.108	7.456	0.035	20.968	20.739
memorial	WM	0.063	7.216	0.021	24.782	29.673
	EE	0.092	6.879	0.029	27.678	30.324
	LP	0.098	7.427	0.036	20.783	22.354
	DL	0.068	7.284	0.023	21.389	28.493
	EEF	0.095	7.349	0.033	22.604	20.192
	ours	0.103	7.526	0.035	20.027	19.334
chandelier	WM	0.025	7.267	0.015	24.313	29.692
	EE	0.057	7.381	0.018	22.672	31.324
	LP	0.056	7.323	0.011	23.782	26.342
	DL	0.022	7.254	0.005	26.382	28.953
	EEF	0.073	7.442	0.022	23.789	24.372
	ours	0.078	7.343	0.029	21.281	21.642

Table 1. Objective evaluation indicators of different methods

Lingfeng Wu, Junbao Hu, Chang Yuan. Exposure Fusion Based on Improved Exposure Evaluation and Double Pyramids[J]. Laser & Optoelectronics Progress, 2021, 58(14): 1410005

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