Influences of SiO2 protective layers and annealing on the laser-induced damage threshold of Ta2O5 films

[1] M. Reichling, A. Bodemann, and N. Kaiser, Thin Solid Films 320, 264 (1998).

[2] H.-B. He, H.-Y. Hu, Z.-P. Tang, Z.-X. Fan, and J.-D. Shao, Appl. Surf. Sci. 241, 442 (2005).

[3] M. Zhan, H. He, Y. Zhao, G. Tian, J. Shao, and Z. Fan, Appl. Surf. Sci. 252, 2126 (2006).

[4] T. T. Hart, T. L. Lichtenstein, C. K. Carniglia, and F. Rainer, NBS (U.S.) Spec. Publ. 638, 344 (1983).

[5] Y. Zhao, Y. Wang, H. Gong, J. Shao, and Z. Fan, Appl. Surf. Sci. 210, 353 (2003).

[6] ISO 11254-1:2000, Lasers and laser-related equipment-determination of laser-induced damage threshold of optical surfaces. Part 1. 1-on-1 test.

[7] I. L. Kim, J.-S. Kim, O.-S. Kwon, S.-T. Ahn, J. S. Chun, and W.-J. Lee, J. Electron. Mater. 24, 1435 (1995).

[8] A. Pignolet, G. M. Rao, and S. B. Krupanidhi, Thin Solid Films 258, 230 (1995).

[9] W. Gao, M. Zhan, S. Fan, J. Shao, and Z. Fan, Appl. Surf. Sci. 250, 195 (2005).

[10] D. Zhang, J. Shao, D. Zhang, S. Fan, T. Tan, and Z. Fan, Opt. Lett. 29, 2870 (2004).

[11] Z. Wu, M. Reichling, Z. Fan, and Z. Wang, Proc. SPIE 1441, 200 (1991).

[12] H. Shinriki, T. Kisu, S.-I. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, IEEE Trans. Electron Devices 37, 1939 (1990).

CLP Journals