Author Affiliations
1School of Instrument Science and Opto-Electronics Engineering, Hefei University of Technology, Hefei, Anhui 230009, China2Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, Hefei University of Technology, Hefei, Anhui 230009, Chinashow less
Fig. 1. Principle of DIC. (a) Reference image; (b) deformed image
Fig. 2. Coordinate system conversion in stereo vision measurement system
Fig. 3. Physical graphs of measured object and measurement system. (a) Mask sample; (b) position and pose measurement system of mask sample on translation and rotation stage
Fig. 4. Relative error of calculation points of different numbers for mask sample on translation and rotation stage. (a) Transverse shift; (b) longitudinal shift; (c) elevation and subsidence; (d) yaw
Fig. 5. Relative error of calculation points of optimal number for different M. (a) Transverse shift; (b) longitudinal shift; (c) elevation and subsidence; (d) yaw
Fig. 6. Relative error of calculation points at different positions for mask sample on translation and rotation stage. (a) Transverse shift; (b) longitudinal shift; (c) elevation and subsidence; (d) yaw
Fig. 7. Schematic diagram of measurement system of position and pose of six degree-of-freedom platform
Fig. 8. Position and pose measurement system for mask sample on six degree-of-freedom platform
Parameter | Value |
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Transverse shift range /mm | -25--25 | Longitudinal shift range /mm | -25--25 | Elevation and subsidence range /mm | -21--21 | Pitching range /(°) | -20--20 | Rolling range /(°) | -20--20 | Yawing range /(°) | -20--20 | Displacement positioning accuracy /mm | 0.5 | Angle positioning accuracy /(°) | 0.5 |
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Table 1. Parameters of six degree-of-freedom platform
Image sequence | Measurement value | Set value | |
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Transverse shift | Longitudinal shift | Elevation and subsidence | Transverse shift | Longitudinal shift | Elevation and subsidence |
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1 | -1.52 | -2.65 | -4.65 | -1.7 | -2.6 | -4.6 | 2 | -2.87 | 1.44 | -0.61 | -2.9 | 1.5 | -0.5 | 3 | -5.58 | 4.28 | -2.27 | -5.5 | 4.4 | -2.1 | 4 | -6.22 | 0.83 | -5.20 | -6.0 | 0.7 | -5.0 | 5 | -6.66 | -2.96 | -1.28 | -6.8 | -2.8 | -1.4 | 6 | -4.47 | 0.39 | -3.92 | -4.8 | 0.6 | -3.8 | 7 | -9.30 | 0.51 | -3.16 | -9.2 | 0.4 | -3.1 | 8 | 9.88 | -2.71 | -9.34 | 10.0 | -2.7 | -9.3 | 9 | 13.61 | -5.09 | 13.40 | 13.8 | -5.2 | 13.2 | 10 | 6.61 | -5.22 | 11.17 | 6.5 | -5.3 | 11.2 |
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Table 2. Measurement results of displacement parameters of mask samplemm
Image sequence | Measurement value | Set value | |
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Roll | Pitch | Yaw | Roll | Pitch | Yaw |
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1 | 1.99 | 0.21 | -0.36 | 1.9 | 0.3 | -0.3 | 2 | -1.16 | 3.11 | -5.15 | -1.0 | 3.2 | -5.3 | 3 | 1.37 | 3.58 | -4.04 | 1.7 | 3.8 | -3.8 | 4 | -2.55 | 3.41 | -5.66 | -2.3 | 3.3 | -5.4 | 5 | 0.18 | 2.84 | 0.70 | 0.2 | 2.7 | 0.6 | 6 | 3.78 | 2.20 | 2.70 | 3.9 | 2.3 | 2.4 | 7 | 9.30 | 3.43 | -4.90 | 9.1 | 3.2 | -5.0 | 8 | 5.69 | 2.00 | -0.53 | 5.7 | 2.1 | -0.3 | 9 | 0.66 | 5.90 | 0.29 | 0.7 | 5.7 | 0.3 | 10 | -8.73 | 9.29 | 7.20 | -8.6 | 9.4 | 7.0 |
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Table 3. Measurement results of rotation parameters of mask sample(°)