• Chinese Optics Letters
  • Vol. 11, Issue s1, S10502 (2013)
Martin Steglich, Thomas Kasebier, Ingmar Hoger, Kevin Fuchsel, Andreas Tunnermann, and Ernst-Bernhard Kley
DOI: 10.3788/col201311.s10502 Cite this Article Set citation alerts
Martin Steglich, Thomas Kasebier, Ingmar Hoger, Kevin Fuchsel, Andreas Tunnermann, Ernst-Bernhard Kley. Black Silicon nanostructures on silicon thin films prepared by reactive ion etching[J]. Chinese Optics Letters, 2013, 11(s1): S10502 Copy Citation Text show less
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Martin Steglich, Thomas Kasebier, Ingmar Hoger, Kevin Fuchsel, Andreas Tunnermann, Ernst-Bernhard Kley. Black Silicon nanostructures on silicon thin films prepared by reactive ion etching[J]. Chinese Optics Letters, 2013, 11(s1): S10502
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