[1] J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz et al.. NIF optical materials and fabrication technologies: an overview ［C］. SPIE, 2004, 5341: 84～101

[2] F. Y. Genin, C. J. Stolz, M. R. Kozlowski. Growth of laser-induced damage during repetitive illumination of HfO2-SiO2 multilayer mirror ［C］. SPIE, 1997, 2966: 273～282

[3] F. F. Kim, A. C. Larry, J. E. Gregory et al.. Microstructural size effects on the dielectric response of inhomogeneous media［C］. SPIE, 1998, 3244: 142～148

[4] F. Y. Genin. C. J. Stolz. Morphologies of laser-induced damage in hafnia-silica multilayer mirror and polarizer coatings ［C］. SPIE, 1996, 2870: 439～448

[5] M. R. Kozlowski, R. J. Tench, R. Chow et al.. Influence of defect shape on laser-induced damage in multilayer coatings ［C］. SPIE, 1994, 2253: 743～750

[6] R. J. Trnch, M. R. Kozlowski, R. Chow. Investigation of the microstructure of coatings for high-power lasers by nonoptical techniques ［C］. SPIE, 1994, 2253: 596～602

[7] M. R. Kozlowski, J. Carr, I. D Hutcheon et al.. Depth profiling of polishing-induced contamination on fused silica surfaces ［C］. SPIE, 1998, 3244: 365～375

[8] Miao Xinxiang, Yuan Xiaodong, Wang Chengcheng et al.. Laser induced damage in fused silica contaminated by Al film ［J］. High Power Laser and Particle Beams, 2009, 22(7): 1653～1656

[9] R. M. Brusasco, B. M. Penetrante, J. E. Peterson et al.. UV-laser conditioning for reduction of 351-nm damage initiation in fused silica ［C］. SPIE, 2002, 4679: 48～55

[10] W. C. Jeffrey, F. Evelyn, J. S. Leslie et al.. Subsurface structure in polished fused silica and diamond turned single crystal silicon ［C］. American Ceramic Society 101st Annual Meeting, Indianapolis, IN (US), 04/25/1999-04/28/1999

[11] Liu Hongjie, Zhou Xingda, Huang Jing et al.. Ultraviolet-damage mechanism of fused-quartz optics in high-power laser ［J］. Acta Optica Sinica, 2009, 29(s2): 10～14

[12] C. Fanara, P. Shore, J. R. Nicholls et al.. A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE surfaces [J]. Adv. Engng. Mater., 2006, 8: 933～939

[13] Huan Jin, Lü Haibing, Ye Lin et al.. Damage threshold improvement of fused silica chip by CO2 laser pretreatment [J]. Chinese J. Lasers, 2007, 34(5): 723～727

[14] B. Brauns, D. Schafer, R. Wolfe. Effect of the substrate preparation with CO2 laser radiation on the laser resistance of optical layers [J]. Thin Solid Films, 1986, 138(2): 157～162

[15] Lü Haibao, Shen Tingzheng, Zhou Weihong et al.. Research of the technology for edge checkout using laser half-focus [J]. J. National University of Defense Technology, 1997, 19(4): 81～86

[16] Li Xibing, Lü Haibing, Xiang Xia et al.. Small size damage mitigation on fused silica surface with CO2 laser ［J］. High Power Laser and Particle Beams, 2009, 22(9): 2209～2213

[17] Chen Ning, Zhang Qinghua, Shi Kaiqi et al.. Laser damage threshold expression & discussion of fused silica by hydrogen fluoride acid etching [J]. Laser Journal, 2006, 27(2): 71～72

[18] S. Xu, H. Lü, X. Yuan et al.. Effect of vacuum on fused silica UV damage ［J］. Chin. Phys. Lett., 2008, 25(1): 223～226

[19] D. Golini, W. I. Kordonski, P. Dumas et al.. Magnetorheological finishing (MRF) in commercial precision optics manufacturing ［C］. SPIE, 1999, 3782: 80～91

[20] D. Golini. Precision optics manufacturing using magnetorheological finishing (MRF) ［C］. SPIE, 1999, 3739: 78～85

[21] A. B Shorey, S. D. Jacobs, W. I. Kordonski et al.. Experiments and observations regarding the mechanisms of glass removal in magnetorheological finishing ［J］. Appl. Opt., 2001, 40(1): 20～33

[22] J. E. DeGroote, A. E. Marino, J. P. Wilson et al.. Removal rate model for magnetorheological finishing of glass ［J］. Appl. Opt., 2007, 46(32): 7927～7941

[23] Wang Bo, Zhang Jufan, Dong Shen. Application of atomic emission spectroscopy analysis in the atmospheric pressure plasma polishing process study ［J］. Spectrosc. & Spect. Anal., 2008, 28(7): 1641～1644

[24] Zhang Jufan, Wang Bo, Dong Shen. Design of the atmospheric pressure low temperature plasma polishing system for machining of ultra-smooth surfaces ［J］. Nanotechnology and Precision Engineering, 2008, 6(5): 222～226