The Elimination of Thermal Runaway in 10.6 μm Laser-Induced Diffusion

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 24 >Issue 12 >Page 1638 > Article

Acta Optica Sinica
Vol. 24, Issue 12, 1638 (2004)

The Elimination of Thermal Runaway in 10.6 μm Laser-Induced Diffusion

[in Chinese]^*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Elimination of Thermal Runaway in 10.6 μm Laser-Induced Diffusion[J]. Acta Optica Sinica, 2004, 24(12): 1638 Copy Citation Text

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References

[4] Siregar M R T, Lüthy W, Affolter K. Dynamics of CO2 laser heating in the processing of silicon. Appl. Phys. Lett., 1980, 36(10): 787～788

[5] Lax M. Temperature rise induced by a laser beam. J. Appl. Phys., 1977, 48(9): 3919～3924

[6] Loze M K, Wright C D. Temperature distributions in semi-infinite and finite-thickness media as a result of absorption of laser light. Appl. Opt., 1997, 36(2): 494～507

CLP Journals

[1] [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Improving of the Equipment of Laser Assisted Microprocessing Used in OEICs[J]. Chinese Journal of Lasers, 2007, 34(s1): 227

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Elimination of Thermal Runaway in 10.6 μm Laser-Induced Diffusion[J]. Acta Optica Sinica, 2004, 24(12): 1638

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