Researching | Design of 0.35 μm Step-and-Repeat Projection Lithography Objective

Journals >Acta Optica Sinica >Volume 20 >Issue 8 >Page 1148 > Article

Acta Optica Sinica
Vol. 20, Issue 8, 1148 (2000)

Design of 0.35 μm Step-and-Repeat Projection Lithography Objective

[in Chinese] and [in Chinese]

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[in Chinese], [in Chinese]. Design of 0.35 μm Step-and-Repeat Projection Lithography Objective[J]. Acta Optica Sinica, 2000, 20(8): 1148 Copy Citation Text

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Abstract

The main points of design of 0.35 μm step-and-repeat projection lithography objective are introduced such as the determination of number aperture and structure model and the selection of material. The difficulties, novel design and a design result of lithography objective are discussed.

Keywords

diffraction limit.photoetching objectives step-and-repeat projection

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[in Chinese], [in Chinese]. Design of 0.35 μm Step-and-Repeat Projection Lithography Objective[J]. Acta Optica Sinica, 2000, 20(8): 1148

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