• Opto-Electronic Engineering
  • Vol. 43, Issue 7, 89 (2016)
ZHANG Lei1、2、*, LIU Hongxiang1, CHEN Guang1, and GAO Weidong1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3969/j.issn.1003-501x.2016.07.015 Cite this Article
    ZHANG Lei, LIU Hongxiang, CHEN Guang, GAO Weidong. Buffer Layer and Protective Layer Improve Laser Induced Damage Threshold of Antireflection Coatings[J]. Opto-Electronic Engineering, 2016, 43(7): 89 Copy Citation Text show less

    Abstract

    To improve the laser induced damage threshold of dual-wavelength antireflection coatings which were deposited by ion beam sputtered for 1 064 nm and 532 nm, a certain thickness of the silica layer was deposited near the substrate and the air respectively to investigate the effect of the buffer layer and the protective layer on antireflection coatings for laser induced damage threshold. The laser induced damage threshold of different antireflection coatings was tested by a 1 064 nm laser system according to ISO 21254-2 standard. The experiment results show that compared with the coatings without buffer layer and protective layer, the laser induced damage threshold of the coatings with buffer layer, the coatings with protective layer and the coatings with buffer layer and protective layer are 65.4%, 66.7%, 119% higher respectively.
    ZHANG Lei, LIU Hongxiang, CHEN Guang, GAO Weidong. Buffer Layer and Protective Layer Improve Laser Induced Damage Threshold of Antireflection Coatings[J]. Opto-Electronic Engineering, 2016, 43(7): 89
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