• Laser & Optoelectronics Progress
  • Vol. 52, Issue 6, 61608 (2015)
Ma Xinjian1、* and Lin Tao2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: 10.3788/lop52.061608 Cite this Article Set citation alerts
    Ma Xinjian, Lin Tao. Effect of Double-Layer SiNx Film on Mono-Crystalline Silicon Solar Cells and XPS Characterization[J]. Laser & Optoelectronics Progress, 2015, 52(6): 61608 Copy Citation Text show less
    References

    [1] Fan Jinxing, Shi Zhengrong, Zhang Chunguang, et al.. Influence of double-layer SiNx thin film deposited by PECVD on solar cell[J]. Advanced Semiconductor Manufacturing Technologies, 2012, 37(3): 192-196.

    [2] O Schultz, S W Glunz, G P Willeke. Multi-crystalline silicon solar cells exceeding 20% efficiency[J]. Progress in Photovoltaic′s: Research and Applications, 2004, 12(7): 553-558.

    [3] Shen Hui, Zeng Zuqin. Soler photovoltaic Technology[M]. Beijing: Chemical Industry Press, 2005.

    [4] Han Peiyu, Ji Jingjia, Wang Zhengao, et al.. The study of SiO2-SiNx stack-layer passivation films deposited by PECVD [J]. Acta Energiae Solaris Sinica, 2010, 31(12): 1449-1552.

    [5] Bikash Kumar, T Baskara Pandian, E Sreekiran, et al.. Benefit of dual layer silicon nitride anti-reflection coating[C]. IEEE PVSC, 2005: 1205-1209.9

    [6] J Hofstetter, C Del Caňizo, S Ponce-Alcántara, et al.. Optimisation of SiNx: H anti-reflection coatings for silicon solar cells[C]. IEEE, 2007: 131-134.

    [7] Zoolfakar A S, Syed Othman S R, Abdullan M H, et al.. Characterization of silicon and dual layer anti-reflecting coating (ARC) for solar cell applications[C]. IEEE, 2009: 543-547.

    [8] Qu Sheng, Mao Hehuang, Han Zenghua, et al.. Crystalline silicon solar cells with PECVD dilayer SiNx:H thin films[C]. Proceedings of the 11th China Solar Photovoltaic Conference and Exhibition, 2010: 76-80.

    [13] He Junpeng, Zhang Yueguang, Shen Weidong, et al.. Optical properties of Al2O3 thin film fabricated by atomic layer deposition[J]. Acta Optica Sinica, 2010, 30(1): 277-282.

    [14] Niu Xiaobin, Liao Yuan, Chang Chao, et al.. Silicon carbon nitride films grown by hot-filament chemical vapor deposition[J]. Journal of Inorganic Materials, 2004, 19(2): 397-403.

    [15] NIST X-ray Photoelectron Spectroscopy Database, Version 4.1 (National Institute of Standards and Technology, Gaithersburg, 2012).[DB]. http://srdata.nist.gov/xps/.Accessed 20 January 2013.

    [16] Faculty of Beijing Normal University. Inorganic Chemistry[M]. Beijing: High Educational Press, 1992: 566.

    [17] Piao Yong, Xu Jun, Gao Peng, et al.. Influence of C content on chemaicl structure and properties of silicon carbonitride film[J]. Chinese Journal of Vacuum Science and Technology, 2006, 26(6): 526-529.

    [18] Guo Qinlin. X-ray photoelectron spectroscopy[J]. Physics, 2007, 36(5): 405-410.

    [19] Ma Xinjian, Lin Tao. Analysis of mono-crystalline silicon solar cells electroluminescence defects and process influencing factors[J]. Laser & Optoelectronics Progress, 2013, 50(3): 031601.

    [20] Ma Xinjian. Research on the Anti-Reflection Coating for Mono-Crystal Silicon Solar Cells[D]. Xi′an: Xi′an University of Technology, 2013.

    CLP Journals

    [1] Jin Lei, Li Yufang, Shen Honglie, Jiang Ye, Yang Wangyang, Yang Nannan, Zheng Chaofan. Damage-Removal and Passivation of Polycrystalline Black Silicon by Reactive Ion Etching[J]. Acta Optica Sinica, 2017, 37(2): 216001

    Ma Xinjian, Lin Tao. Effect of Double-Layer SiNx Film on Mono-Crystalline Silicon Solar Cells and XPS Characterization[J]. Laser & Optoelectronics Progress, 2015, 52(6): 61608
    Download Citation