[1] Wei ZHANG. Development of Large-Area and Multilevel Nanoimprint Lithography and the Application in MOSFETs [D]. Princeton:Princeton University,2001.
[2] Christopher James MACKAY.Development of a Baseline Process for the Integration of Step and Flash Imprint Lithography into a MOSFET Fabrication Process[D]. Austin:University of Texas at Austin,2002.
[3] R. ISLAM,B. WIELDER,P. LINDNER,et al.One micro precision optically aligned method for hot-embossing and nanoimprinting [A]. Pro. IEEE Int. Conf. on Sensors [C]. Orlando, Florida, USA:IEEE,2002. 931-935.
[5] D. RIVERO,M. PANINDAVOINE,S. PETIT.Real-time sub-pixel cross bar position metrology[J].Real-Time Imaging,2002,8(2):105-113.
[6] D. D. UDREA,P. J. BRYANSTON-CROSS,W. K. LEE,et al.Two sub-pixel processing algorithms for high accuracy particle centre estimation in low seeding density particle image velocimetry[J].Optics&Laser Technology,1996,28(5):389-396.
[7] E. H. ANDERSON,D. HA,J. A. LIDDLE. Sub-pixel alignment for direct-write electron beam lithography[J]. Microelectronic Engineering,2004,73-74:74-79.