• Acta Optica Sinica
  • Vol. 19, Issue 2, 277 (1999)
[in Chinese]1, [in Chinese]2, [in Chinese]3, and [in Chinese]4
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Computer Simulation Studies of Laser Direct Writing Process[J]. Acta Optica Sinica, 1999, 19(2): 277 Copy Citation Text show less
    References

    [1] J. Cordinley. Application of a binary diffractive optics for beam shaping in semiconductor processing by lasers. Appl. Opt., 1993, 32(14):2538~2542

    [2] C. Londoo, P. P. Clark. Modeling diffractive efficiency effects when designing hybrid diffractive lens systems. Appl. Opt., 1992, 31(13):2248~2252

    [3] W. Goltsos, M. Holz. Binary micro optics: an application to beam steering. Proc. SPIE, 1989, 1052:131~141

    [4] V. V. Wong, G. J. Swanson. Design and fabrication of a Guassian fan-out optical interconnect. Appl. Opt., 1993, 32(14):2502~2511

    [5] M. T. Gale, M. Rossi, J. Pedersen et. al.. Fabrication of continuous-relief micro-optical elements by direct laser writing photoresists. Opt. Eng., 1994, 33(11):3556~3566

    [6] T. J. Mchugh, D. A. Zweig. Recent advances in binary optics. Proc. SPIE, 1989, 1052:85~90

    [7] J. Jahns, S. J. Walker. Two-demensional array of diffractive microlenses fabricated by thin film deposition. Appl. Opt., 1990, 29(7):931~936

    [8] F. H. Dill, W. P. Hornberger, P. S. Hauge et al.. Characterization of positive photoresist. IEEE Trans. on Electron Devices, 1975, ED-22(7):445~452

    [9] C. A. Mack. Developmant of positive photoresist. J. Electrochem. Soc.: Solid-State Science and Technology, 1987, 134(1):148~152

    [10] R. E. Jewett, P. I. Hagouel, A. R. Neureuther et. al.. Line-profile resist development simulation techniques. Polymer Engineering and Science, 1977, 17(6):381~384

    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Computer Simulation Studies of Laser Direct Writing Process[J]. Acta Optica Sinica, 1999, 19(2): 277
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