[1] Irom F, Nguyen D N, Underwood M L, Virtanen A[J]. IEEE Trans. Nucl. Sci., 57, 3329(2010).
[2] Weller R A, Mendenhall M H, Reed R A, Schrimpf R D[J]. Trans. Nucl. Sci., 57, 1726(2010).
[3] Fu C J, Guo D Y[J]. Micro-nano Technology, 9, 14(2006).
[4] Mikolajick T, Slesazeck S, Park M H, Schroeder U[J]. MRS Bull., 43, 340(2018).
[5] Li H, Hu M, Li C, Duan S[J]. IEEE Computer Society Annual Symposium on VLSI ISVLSI, 65(2014).
[6] He W[J]. Ph. D. Dissertation(2007).
[7] Sharma D K, Khosla R, Sharma S K[J]. Solid-State Electron., 42, 111(2015).
[8] Wang P, Wang Y, Ye L, Wu M, Xie R, Wang X, Hu W[J]. Small, 14, 1800492(2018).
[9] Wang J, Fang H, Wang X, Chen X, Lu W, Hu W[J]. Small, 13, 1700894(2017).
[10] Wang X, Wang P, Wang J, Hu , W. , Zhou , X , Guo N, Chu J[J]. Adv. Mater., 27, 6575(2015).
[11] Tu L, Cao R, Wang X, Chen Y, Wu S, Wang F, Chu J[J]. Nat. Commun., 11, 1(2020).
[12] Tu L, Wang X, Wang J, Meng X, Chu J[J]. Adv. Electron. Mater., 4, 1800231(2018).
[13] Tang M H[J]. Ph. D. Dissertation(2007).
[14] Amusan O A, Massengill L W, Baze M P[J]. IEEE Trans. Nucl. Sci., 54, 2584(2007).
[15] Coic Y M, Musseau O, Leray J L[J]. IEEE Trans. Nucl. Sci., 41, 495(1994).
[16] Li X, Lai L[J]. IEEE Computer Society Annual Symposium on VLSI ISVLSI, 750(2018).
[17] Ni K, Li X Q, Jeffrey A S, Matthew J, Suman D[J]. IEEE Electron Device Lett., 39, 1656(2018).
[19] Takahashi M, Zhang W, Sakai S[J]. IEEE International Memory Workshop IMW, 1(2018).
[20] Gong N B, Ma T P[J]. IEEE Electron Device Lett., 37, 1123(2016).
[21] Sharma A, Roy K[J]. IEEE Electron Device Lett., 39, 359(2018).
[22] Liu Q L[J]. Ph. D. Dissertation(2018).
[23] Ding M[J]. Strong Laser and Particle Beam, 31, 066001(2019).
[24] Bosser A L, Gupta V, Javanainen A[J]. IEEE Trans. Nucl. Sci., 65, 1708(2018).
[26] [J]. Synopsys Inc. https://www.synopsys.com/silicon/tcad.html
[27] [J]. Nanoscale Integration and Modeling Group. http://ptm.asu.edu/
[28] Miller S L, Mcwhorter P J[J]. J. Appl. Phys., 72, 5999(1992).